南京大学学报(自然科学版) ›› 2013, Vol. 49 ›› Issue (1): 3239.
和佐清孝
Kiyotaka Wasa**
摘要: 压电基(PZT)-ABO3型钙钦矿陶瓷体材料可用于制作各种压电微机电系统(MEMS).通常
PZT一基陶瓷显示多晶结构,而单晶PZT一基薄膜材料吸取PZT一基陶瓷优良的铁电性,可用于制作薄
膜压电MFMS.在PZT一基材料中,三元钙钦矿,即由二元钙钦矿PZT固溶体掺入添加物(如:Pb(Mg,
Nb) O3 (PMN)和Pb(Mn, Nb) O3)(PMnN)),可用于制作薄膜MEMS,因为掺入的添加物扩展了原二元
钙钦矿PZT的介电和铁电响应.木文研究由射频溅射法外延生长在具有SrRuO3 /Pt过渡层的(001)
MgO单晶基片上的PZT一基三元配合物(PMnN-PZT)单晶薄膜,发现溅射的PZT一基三元配合物
xPMnN-(1一x)PZT,x=0. 06,显示高密度单晶、而无体单晶的晶粒和界面层结构.溅射的薄膜显示奇
异的铁电性质,即:非常高自极化Pr(Pr=80-100?C,体陶瓷:Pr=20-30?C),高居里点TC (TC=500-600 ?C,体陶瓷;TC=350-380 ?C),小介电常数ε *(ε* =100-150,体陶瓷: ε*=800~1300).
这些奇异的铁电性质是所溅射的薄膜结构所固有的,不可能由传统的PZT一基陶瓷得到.最后,对这些
奇异的铁电性质可能应用于压电薄膜MEMS进行了讨论.
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