Investigation on the influence of gate dielectric material and size onthin⁃film transistors performance

Zhihui Pei; Guoxuan Qin

doi:10.13232/j.cnki.jnju.2019.05.005

Zhihui Pei,Guoxuan Qin

Journal of Nanjing University(Natural Sciences) ›› 2019, Vol. 55 ›› Issue (5) : 740-749.

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Journal of Nanjing University(Natural Sciences) ›› 2019, Vol. 55 ›› Issue (5) : 740-749. DOI: 10.13232/j.cnki.jnju.2019.05.005

Investigation on the influence of gate dielectric material and size onthin⁃film transistors performance

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2019, 55(5): 740-749 https://doi.org/10.13232/j.cnki.jnju.2019.05.005

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Received	Published
2019-06-11	2019-09-30
Issue Date
2019-11-01

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