南京大学学报(自然科学版) ›› 2017, Vol. 53 ›› Issue (3): 428–.
林圳旭*，宋 捷，黄 锐，王 岩，王怀佩，郭艳青，宋 超
Lin Zhenxu*，Song Jie，Huang Rui，Wang Yan，Wang Huaipei，Guo Yanqing，Song Chao
摘要： 采用甚高频等离子增强化学气相沉积技术，以SiH4，CH4和O2作为反应气源，在150 ℃下制备非晶碳氧化硅薄膜，并对薄膜进行不同条件下快速热退火处理，研究快速热退火处理对其结构和发光特性的影响．实验表明，原始沉积薄膜在可见光全波段展现较强的光致发光特性，经过快速热退火处理后，其发光强度显著增强．薄膜在700 ℃经过快速热退火10 s后，相比于原始沉积薄膜，其发光强度增强6倍，肉眼可见强的蓝绿光光发射．光荧光谱(PL)分析表明，薄膜的发光峰位不随激发波长的改变而发生明显变化．通过结合拉曼(Raman)光谱及傅里叶红外吸收(FTIR)光谱对薄膜的微结构及键合结构分析，分析了不同退火温度和退火时间对其蓝绿光发射增强机制的影响．
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