南京大学学报(自然科学版) ›› 2017, Vol. 53 ›› Issue (3): 407–.

• • 上一篇    下一篇

 利用不同沉积温度和衬底控制压电/压磁异质结的磁电耦合系数

 吴冬梅1,宁仁杰2,白 刚2,3,4*,刘治国3   

  • 出版日期:2017-05-30 发布日期:2017-05-30
  • 作者简介: 1.南京邮电大学自动化学院,南京,210023;2.南京邮电大学电子科学与工程学院,南京,210023;3.南京大学固体微结构物理国家重点实验室,南京,210093;4.南京航空航天大学机械结构力学及控制国家重点实验室,南京,210016
  • 基金资助:
     基金项目:国家自然科学基金(51602159),中国博士后科学基金(2016M590449),江苏省自然科学基金(BK20130873),江苏省博士后科学基金(1601242C),南京邮电大学国自基金孵化项目(NY215151,NY214072)
    收稿日期:2016-10-27
    *通讯联系人,E­mail:baigang@njupt.edu.cn

 Controlling magnetoelectric coupling effect in piezoelectric/piezomagnetic heterostructure by using deposition temperatures and substrates

 Wu Dongmei1,Ning Renjie2,Bai Gang2,3,4*,Liu Zhiguo3   

  • Online:2017-05-30 Published:2017-05-30
  • About author: 1.School of Automation,Nanjing University of Posts and Telecommunications,Nanjing,210023,China;2.College of Electronic Science and Engineering,Nanjing University of Posts and Telecommunications,
    Nanjing,210023,China;3.Laboratory of Solid State Microstructures,Nanjing University,Nanjing,210093,China;4.State Key Laboratory of Mechanics and Control of Mechanical Structures,Nanjing University of
    Aeronautics and Astronautics,Nanjing,210016,China

摘要:  以生长在不同电极衬底:MgO,c­sapphire,a­sapphire,Si上的钙钛矿PbTiO3(PTO)/Terfenol­D压电/压磁异质结为例,利用唯象热力学理论研究了热应力对压电/压磁异质结磁电耦合效应的影响.计算结果表明,铁电薄膜内的热应力强烈依赖于薄膜沉积温度与衬底、薄膜之间热膨胀系数的差异,而热应力又显著影响磁电耦合性能.对于热膨胀系数大于薄膜材料的衬底,如MgO,铁电薄膜内的热应力为压应力,导致压电/压磁异质结的磁电电压系数增强;对于热膨胀系数小于薄膜材料衬底,如c­sapphire,a­sapphire,Si,铁电薄膜内热应力为拉应力,导致压电/压磁异质结的磁电电压系数减小.研究提出了通过改变沉积温度以及选择合适衬底来调控压电/压磁异质结磁电耦合效应的新思路,为工程上增强压电/压磁异质结磁电耦合性能提供了新的途径.

Abstract:  The impact of thermal stress on the magnetoelectric coupling in ferroelectric PbTiO3(PTO)/ferromagnetic Terfenol­D heterostructures was investigated based on Landau­Devonshire thermodynamic model.The results show that magnetoelectric coupling property of the heterostructures depends strongly on the thermal stress in PTO films decided by the deposition temperature TG and the thermal expansion coefficients’ difference between PTO films and substrates.For IC­compatible substrates such as Si,c­sapphire,and a­sapphire that induce tensile in plane thermal stresses,the magnetoelectric coupling of PTO/Terfenol­D heterostructures were decreased.Whereas for PTO films on MgO,compressive thermal in­plane stresses can enhance magnetoelectric coupling.Careful choice of the deposition temperature and the thermal expansion coefficients of the substrates might be used as additional design parameters to achieve desirable magnetoelectric coupling properties of multiferroic heterostructures.

 

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